Optical characterization of CO2-laser-ablated Si-rich SiOx
| dc.citation.epage | en_US | |
| dc.citation.issue | 15 | en_US |
| dc.citation.volume | 90 | en_US |
| dc.citation.woscount | 6 | |
| dc.contributor.author | Lin, Gong-Ru | en_US |
| dc.contributor.author | Lin, Chun-Jung | en_US |
| dc.contributor.author | Chang, Yia-Chung | en_US |
| dc.contributor.department | 光電工程學系 | zh_TW |
| dc.contributor.department | Department of Photonics | en_US |
| dc.date.accessioned | 2014-12-08T15:14:17Z | |
| dc.date.available | 2014-12-08T15:14:17Z | |
| dc.date.issued | 2007-04-09 | en_US |
| dc.description.abstract | Anomalous absorption and the corresponding change in the optical band gap of a CO2-laser-ablated Si-rich SiO2 (SiOx) film are studied. The optical band gap energy of as-grown nonstoichiometric SiOx is slightly reduced by increasing Si-Si bonds as compared to quartz. After rapid thermal annealing using a CO2 laser, the dehydrogenation of SiOx film further increases the Si-Si bonding states and redshifts the optical band gap by 1 eV. Laser ablation is initiated at a laser intensity of > 7.5 kW/cm(2), leaving numerous luminescent centers that are related to neutral oxygen vacancy defects, increasing the absorption coefficient and related optical band gap energy, and reducing the refractive index in partially annealed SiOx. (c) 2007 American Institute of Physics. | en_US |
| dc.identifier.doi | 10.1063/1.2721141 | en_US |
| dc.identifier.issn | 0003-6951 | en_US |
| dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1063/1.2721141 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/10923 | |
| dc.identifier.wosnumber | WOS:000245690700032 | |
| dc.language.iso | en_US | en_US |
| dc.title | Optical characterization of CO2-laser-ablated Si-rich SiOx | en_US |
| dc.type | Article | en_US |