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Unusual Threshold Voltage Shift Caused by Self-Heating-Induced Charge Trapping Effect

dc.citation.epageH97en_US
dc.citation.issue4en_US
dc.citation.spageH95en_US
dc.citation.volume13en_US
dc.citation.woscount1
dc.contributor.authorJian, Fu-Yenen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorChu, An-Kuoen_US
dc.contributor.authorChen, Te-Chihen_US
dc.contributor.authorChen, Shih-Chingen_US
dc.contributor.authorLin, Chia-Shengen_US
dc.contributor.authorLi, Hung-Weien_US
dc.contributor.authorLee, Ming-Hsienen_US
dc.contributor.authorChen, Jim-Shoneen_US
dc.contributor.authorShih, Ching-Chiehen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:08:02Z
dc.date.available2014-12-08T15:08:02Z
dc.date.issued2010en_US
dc.description.abstractThis article investigates the threshold voltage (V(t)) shift induced by a self-heating effect for n-channel low temperature poly-Si thin film transistors (TFTs) and finds that there is a shift of more than 3 V in the negative direction after a self-heating operation of 100 ms. The negative V(t) shift can be attributed to the charge-trapping effect caused by the holes generated by trap-assisted band-to-band thermionic field emission and trapped in the grain boundary of the poly-Si film substrate. We used lateral body contact structure to verify that this unusual V(t) shift is related to the holes trapped in the substrate. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3290686] All rights reserved.en_US
dc.identifier.doi10.1149/1.3290686en_US
dc.identifier.issn1099-0062en_US
dc.identifier.journalELECTROCHEMICAL AND SOLID STATE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1149/1.3290686en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6299
dc.identifier.wosnumberWOS:000274390800015
dc.language.isoen_USen_US
dc.titleUnusual Threshold Voltage Shift Caused by Self-Heating-Induced Charge Trapping Effecten_US
dc.typeArticleen_US

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