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True near-field optical characters of a GaAlAs semiconductor laser diode

dc.citation.epage4465en_US
dc.citation.issue12en_US
dc.citation.spage4463en_US
dc.citation.volume70en_US
dc.citation.woscount2
dc.contributor.authorChen, SHen_US
dc.contributor.authorTsai, DPen_US
dc.contributor.authorChen, YFen_US
dc.contributor.authorOng, PMen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:45:57Z
dc.date.available2014-12-08T15:45:57Z
dc.date.issued1999-12-01en_US
dc.description.abstractIn this research we have taken advantage of near-field scanning optical microscopy, a recently developed technique, to test the optical nature of GaAlAs semiconductor laser diodes working at 780 nm. With this method, both the images of the topographic and the near-field intensity of the laser diodes can be simultaneously obtained. With the obtained results, we can analyze the variety of the geometric structure, the local near-field optical intensity, the propagating modes, and the near-field mode-field diameter at different working states of the laser diodes. Hereby, we can find the factors that affected the radiation cavity of the laser diode and explore its alive state. (C) 1999 American Institute of Physics. [S0034-6748(99)01112-0].en_US
dc.identifier.issn0034-6748en_US
dc.identifier.journalREVIEW OF SCIENTIFIC INSTRUMENTSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/30907
dc.identifier.wosnumberWOS:000084052100002
dc.language.isoen_USen_US
dc.titleTrue near-field optical characters of a GaAlAs semiconductor laser diodeen_US
dc.typeArticleen_US

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