Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method
| dc.citation.epage | 303 | en_US |
| dc.citation.spage | 294 | en_US |
| dc.citation.volume | 2639 | en_US |
| dc.contributor.author | Yeh, CF | en_US |
| dc.contributor.author | Lin, SS | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:27:43Z | |
| dc.date.available | 2014-12-08T15:27:43Z | |
| dc.date.issued | 1995 | en_US |
| dc.identifier.doi | 10.1117/12.221287 | en_US |
| dc.identifier.isbn | 0-8194-2005-0 | en_US |
| dc.identifier.journal | MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.221287 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/19970 | |
| dc.identifier.wosnumber | WOS:A1995BE29X00033 | |
| dc.language.iso | en_US | en_US |
| dc.subject | low-stress | en_US |
| dc.subject | liquid phase deposition | en_US |
| dc.subject | SiO2-F-x(x) | en_US |
| dc.title | Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method | en_US |
| dc.type | Proceedings Paper | en_US |