Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method

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A1995BE29X00033.pdf (204.59 KB)

Date

Authors

DOI

10.1117/12.221287

Keywords

low-stress , liquid phase deposition , SiO2-F-x(x)

URI

http://dx.doi.org/10.1117/12.221287
https://ir.lib.nycu.edu.tw/handle/11536/19970

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會議論文;;Conferences Paper