標題: | Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method |
作者: | Yeh, CF Lin, SS 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | low-stress;liquid phase deposition;SiO2-F-x(x) |
公開日期: | 1995 |
URI: | http://hdl.handle.net/11536/19970 http://dx.doi.org/10.1117/12.221287 |
ISBN: | 0-8194-2005-0 |
DOI: | 10.1117/12.221287 |
期刊: | MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY |
Volume: | 2639 |
起始頁: | 294 |
結束頁: | 303 |
顯示於類別: | 會議論文 |