Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method

標題:	Novel low-stress SiO2-F-x(x) film deposited by room-temperature liquid-phase deposition method
作者:	Yeh, CF Lin, SS 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
關鍵字:	low-stress;liquid phase deposition;SiO2-F-x(x)
公開日期:	1995
URI:	http://hdl.handle.net/11536/19970 http://dx.doi.org/10.1117/12.221287
ISBN:	0-8194-2005-0
DOI:	10.1117/12.221287
期刊:	MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY
Volume:	2639
起始頁:	294
結束頁:	303
Appears in Collections:	Conferences Paper

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