Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology

標題:	Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology
作者:	Yeh, CF Lee, YC Su, JL 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
關鍵字:	low-stress;liquid phase deposition;LPD;SiO2-xFx;selective deposition
公開日期:	1996
URI:	http://hdl.handle.net/11536/19813
ISBN:	0-8194-2277-0
期刊:	MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II
Volume:	2879
起始頁:	260
結束頁:	265
顯示於類別：	會議論文