標題: Selective SiO2-xFx growth with liquid-phase deposition for MEMS technology
作者: Yeh, CF
Lee, YC
Su, JL
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: low-stress;liquid phase deposition;LPD;SiO2-xFx;selective deposition
公開日期: 1996
URI: http://hdl.handle.net/11536/19813
ISBN: 0-8194-2277-0
期刊: MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II
Volume: 2879
起始頁: 260
結束頁: 265
Appears in Collections:Conferences Paper