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學術出版;;Publications
會議論文;;Conferences Paper
Accurate modeling and characterization of mobility in tensile and compressive stress for state-of-the-art manufacturing NMOSFETs
Accurate modeling and characterization of mobility in tensile and compressive stress for state-of-the-art manufacturing NMOSFETs
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Date
2007
Authors
Wang, J. -S.
Chen, William P. N.
Shih, C. -H.
Lien, C.
Su, Pin
Sheu, Y. M.
Chao, Donald Y. -S.
Goto, K.
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https://ir.lib.nycu.edu.tw/handle/11536/135150
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