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Influence of Frank elastic constant anisotropy on optical pattern formation using nematic liquid crystal films

dc.citation.epage6233en_US
dc.citation.issue9Aen_US
dc.citation.spage6229en_US
dc.citation.volume43en_US
dc.citation.woscount0
dc.contributor.authorHsu, HKen_US
dc.contributor.authorLai, YCen_US
dc.contributor.authorChen, SHen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:38:39Z
dc.date.available2014-12-08T15:38:39Z
dc.date.issued2004-09-01en_US
dc.description.abstractWe investigate the influence of the Frank elastic constant anisotropy on optical pattern formation using nematic liquid crystal (NLC) films in one-feedback-mirror systems. The governing diffusion-like equation for the parallel planar-aligned and the vertical-aligned NLC films with an externally biasing quasi-static electric field under the hard boundary assumption is derived. The intrinsic Frank elastic constant anisotropy induces the anisotropy of the diffusion length, which results in the anisotropic distribution of the threshold intensity for optical pattern formation. The effects of the elastic constant anisotropy on optical pattern formation are studied for the first time and the obtained numerical results can reasonably explain the optical patterns that are formed.en_US
dc.identifier.doi10.1143/JJAP.43.6229en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.43.6229en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/26444
dc.identifier.wosnumberWOS:000224579000062
dc.language.isoen_USen_US
dc.subjectliquid crystalsen_US
dc.subjectnonlinear opticsen_US
dc.subjecttransverse effectsen_US
dc.subjectoptical patternsen_US
dc.subjectFrank elastic constant anisotropyen_US
dc.titleInfluence of Frank elastic constant anisotropy on optical pattern formation using nematic liquid crystal filmsen_US
dc.typeArticleen_US

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