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InGaN/GaN nanostripe grown on pattern sapphire by metal organic chemical vapor deposition

dc.citation.epageen_US
dc.citation.issue1en_US
dc.citation.volume90en_US
dc.citation.woscount10
dc.contributor.authorKo, T. S.en_US
dc.contributor.authorWang, T. C.en_US
dc.contributor.authorGao, R. C.en_US
dc.contributor.authorLee, Y. J.en_US
dc.contributor.authorLu, T. C.en_US
dc.contributor.authorKuo, H. C.en_US
dc.contributor.authorWang, S. C.en_US
dc.contributor.authorChen, H. G.en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:14:57Z
dc.date.available2014-12-08T15:14:57Z
dc.date.issued2007-01-01en_US
dc.description.abstractThe authors have used metal organic chemical vapor deposition to grow InGaN/GaN multiple quantum well (MQW) nanostripes on trapezoidally patterned c-plane sapphire substrates. Transmission electron microscopy (TEM) images clearly revealed that the MQWs grew not only on the top faces of the trapezoids but also on both lateral side facets along the [0001] direction defined by the selected area electron diffraction pattern. Meanwhile, dislocations that stretched from the interfaces between the GaN and the substrates did not pass through the MQWs in the TEM observation. Microphotoluminescence measurements verified that the luminescence efficiency from a single nanostripe was enhanced by up to fivefold relative to those of regular thin film MQW structures. Observation of the cathodoluminescence identified the areas of light emission and confirmed that enhanced emission occurred from the nanostripes. (c) 2007 American Institute of Physics.en_US
dc.identifier.doi10.1063/1.2430487en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2430487en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/11244
dc.identifier.wosnumberWOS:000243379900087
dc.language.isoen_USen_US
dc.titleInGaN/GaN nanostripe grown on pattern sapphire by metal organic chemical vapor depositionen_US
dc.typeArticleen_US

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