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Low-temperature growth of ZnO nanorods in anodic aluminum oxide on Si substrate by atomic layer deposition

dc.citation.epageen_US
dc.citation.issue3en_US
dc.citation.volume90en_US
dc.citation.woscount48
dc.contributor.authorYang, Ching-Jungen_US
dc.contributor.authorWang, Shun-Minen_US
dc.contributor.authorLiang, Shih-Weien_US
dc.contributor.authorChang, Yung-Huangen_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorShieh, Jia-Minen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:14:52Z
dc.date.available2014-12-08T15:14:52Z
dc.date.issued2007-01-15en_US
dc.description.abstractLow-temperature growth of self-organized ZnO nanorods on Si substrate is achieved using anodic aluminum oxide and atomic layer deposition at 250 degrees C without catalyst or seed layer. Photoluminescence spectrum indicates that the ZnO nanorod arrays exhibit a blue/green luminescence at 480 nm. In addition, the nanorod arrays demonstrate excellent field-emission properties with a turn-on electric field of 6.5 V mu m(-1) and a threshold electric field of 9.8 V mu m(-1), which are attributed to the perfectly perpendicular alignment of ZnO nanorods to the Si substrate. (c) 2007 American Institute of Physics.en_US
dc.identifier.doi10.1063/1.2431786en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2431786en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/11222
dc.identifier.wosnumberWOS:000243582400070
dc.language.isoen_USen_US
dc.titleLow-temperature growth of ZnO nanorods in anodic aluminum oxide on Si substrate by atomic layer depositionen_US
dc.typeArticleen_US

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