OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS
| dc.citation.epage | 462 | en_US |
| dc.citation.issue | 2 | en_US |
| dc.citation.spage | 458 | en_US |
| dc.citation.volume | 130 | en_US |
| dc.citation.woscount | 5 | |
| dc.contributor.author | WU, CY | en_US |
| dc.contributor.author | KING, CW | en_US |
| dc.contributor.author | LEE, MK | en_US |
| dc.contributor.author | CHEN, CT | en_US |
| dc.contributor.author | SHIH, CT | en_US |
| dc.contributor.department | 電控工程研究所 | zh_TW |
| dc.contributor.department | Institute of Electrical and Control Engineering | en_US |
| dc.date.accessioned | 2014-12-08T15:06:23Z | |
| dc.date.available | 2014-12-08T15:06:23Z | |
| dc.date.issued | 1983 | en_US |
| dc.identifier.issn | 0013-4651 | en_US |
| dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4944 | |
| dc.identifier.wosnumber | WOS:A1983QB20100041 | |
| dc.language.iso | en_US | en_US |
| dc.title | OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS | en_US |
| dc.type | Article | en_US |