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Ferromagnetic GeMn thin film prepared by ion implantation and ion beam induced epitaxial crystallization annealing

dc.citation.epageen_US
dc.citation.issue24en_US
dc.citation.volume100en_US
dc.citation.woscount0
dc.contributor.authorChen, C. H.en_US
dc.contributor.authorNiu, H.en_US
dc.contributor.authorYan, D. C.en_US
dc.contributor.authorHsieh, H. H.en_US
dc.contributor.authorLee, C. P.en_US
dc.contributor.authorChi, C. C.en_US
dc.contributor.department奈米科技中心zh_TW
dc.contributor.departmentCenter for Nanoscience and Technologyen_US
dc.date.accessioned2014-12-08T15:23:35Z
dc.date.available2014-12-08T15:23:35Z
dc.date.issued2012-06-11en_US
dc.description.abstractFerromagnetic GeMn was prepared by Mn implantation followed by ion beam-induced epitaxial crystallization annealing. The damage caused by Mn implantation was repaired by subsequent helium ion irradiation. Various structural analyses were performed and Mn ions were found to incorporate uniformly into the Ge lattice without the formation of any secondary phases. The remnant magnetic moment exhibited room temperature ferromagnetism. Anomalous Hall effect and field dependent magnetization were measured at the same time at room temperature indicating spin polarized free carrier transport. Additional measurement using x-ray magnetic circular dichroism also revealed that the carriers were spin-polarized. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4729752]en_US
dc.identifier.doi242412en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/242412en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16482
dc.identifier.wosnumberWOS:000305269200049
dc.language.isoen_USen_US
dc.titleFerromagnetic GeMn thin film prepared by ion implantation and ion beam induced epitaxial crystallization annealingen_US
dc.typeArticleen_US

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