Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
| dc.citation.epage | 0 | en_US |
| dc.citation.spage | 0 | en_US |
| dc.citation.woscount | 0 | en_US |
| dc.contributor.author | Borland, John | en_US |
| dc.contributor.author | Chaung, Shang-Shuin | en_US |
| dc.contributor.author | Tseng, Tseung-Yuen | en_US |
| dc.contributor.author | Joshi, Abhijeet | en_US |
| dc.contributor.author | Basol, Bulent | en_US |
| dc.contributor.author | Lee, Yao-Jen | en_US |
| dc.contributor.author | Kuroi, Takashi | en_US |
| dc.contributor.author | Goodman, Gary | en_US |
| dc.contributor.author | Khapochkina, Nadya | en_US |
| dc.contributor.author | Buyuklimanli, Temel | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2020-02-02T23:55:35Z | |
| dc.date.available | 2020-02-02T23:55:35Z | |
| dc.date.issued | 2019-01-01 | en_US |
| dc.identifier.isbn | 978-4-86348-727-7 | en_US |
| dc.identifier.journal | 2019 NINETEENTH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT) | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/153690 | |
| dc.identifier.wosnumber | WOS:000502755400009 | en_US |
| dc.language.iso | en_US | en_US |
| dc.title | Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering | en_US |
| dc.type | Proceedings Paper | en_US |
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