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會議論文;;Conferences Paper
Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
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Date
2019-01-01
Authors
Borland, John
Chaung, Shang-Shuin
Tseng, Tseung-Yuen
Joshi, Abhijeet
Basol, Bulent
Lee, Yao-Jen
Kuroi, Takashi
Goodman, Gary
Khapochkina, Nadya
Buyuklimanli, Temel
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https://ir.lib.nycu.edu.tw/handle/11536/153690
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