標題: | Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering |
作者: | Borland, John Chaung, Shang-Shuin Tseng, Tseung-Yuen Joshi, Abhijeet Basol, Bulent Lee, Yao-Jen Kuroi, Takashi Goodman, Gary Khapochkina, Nadya Buyuklimanli, Temel 交大名義發表 National Chiao Tung University |
公開日期: | 1-一月-2019 |
URI: | http://hdl.handle.net/11536/153690 |
ISBN: | 978-4-86348-727-7 |
期刊: | 2019 NINETEENTH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT) |
起始頁: | 0 |
結束頁: | 0 |
顯示於類別: | 會議論文 |