Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering

標題:	Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
作者:	Borland, John Chaung, Shang-Shuin Tseng, Tseung-Yuen Joshi, Abhijeet Basol, Bulent Lee, Yao-Jen Kuroi, Takashi Goodman, Gary Khapochkina, Nadya Buyuklimanli, Temel 交大名義發表 National Chiao Tung University
公開日期:	1-一月-2019
URI:	http://hdl.handle.net/11536/153690
ISBN:	978-4-86348-727-7
期刊:	2019 NINETEENTH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT)
起始頁:	0
結束頁:	0
顯示於類別：	會議論文