標題: Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering
作者: Borland, John
Chaung, Shang-Shuin
Tseng, Tseung-Yuen
Joshi, Abhijeet
Basol, Bulent
Lee, Yao-Jen
Kuroi, Takashi
Goodman, Gary
Khapochkina, Nadya
Buyuklimanli, Temel
交大名義發表
National Chiao Tung University
公開日期: 1-Jan-2019
URI: http://hdl.handle.net/11536/153690
ISBN: 978-4-86348-727-7
期刊: 2019 NINETEENTH INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY (IWJT)
起始頁: 0
結束頁: 0
Appears in Collections:Conferences Paper