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Design of Artificial Hollow Moth-Eye Structures Using Anodic Nanocones for High-Performance Optics

dc.citation.epage6589en_US
dc.citation.issue24en_US
dc.citation.spage6583en_US
dc.citation.volume22en_US
dc.citation.woscount11
dc.contributor.authorWu, Chia-Tienen_US
dc.contributor.authorLin, Chun-Hungen_US
dc.contributor.authorCheng, Chiehen_US
dc.contributor.authorWu, Chung-Shuen_US
dc.contributor.authorTing, Huai-Chenen_US
dc.contributor.authorChang, Feng-Chihen_US
dc.contributor.authorKo, Fu-Hsiangen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:38:13Z
dc.date.available2014-12-08T15:38:13Z
dc.date.issued2010-12-28en_US
dc.description.abstractWe demonstrated an innovative approach for the fabrication of self-organized, hollow-to-solid nanocone arrays, using a decoupling two-step anodization of an Al/Ta interlayer on a substrate. The porosity of the hollow nanostructures was tunable by the deposited thickness of Ta film. We also employed subwavelength nanocone arrays as Moth-eye structures for high-performance antireflection coatings. These oxide nanostructures greatly suppressed reflectance over a large range of wavelengths and angles of incidence and displayed a good mechanical stability. When a corresponding porosity was designed, these nanostructures could be applied to various substrates for an effective antireflection coating. In addition, we were able to customize antireflection coatings for various types of substrates or materials of interest based on the suitable coating of initial Ta thickness.en_US
dc.identifier.doi10.1021/cm102408den_US
dc.identifier.issn0897-4756en_US
dc.identifier.journalCHEMISTRY OF MATERIALSen_US
dc.identifier.urihttp://dx.doi.org/10.1021/cm102408den_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/26205
dc.identifier.wosnumberWOS:000285429000011
dc.language.isoen_USen_US
dc.titleDesign of Artificial Hollow Moth-Eye Structures Using Anodic Nanocones for High-Performance Opticsen_US
dc.typeArticleen_US

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