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Chemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditions

dc.citation.epage11475en_US
dc.citation.issue50en_US
dc.citation.spage11465en_US
dc.citation.volume60en_US
dc.citation.woscount12
dc.contributor.authorChen, MYen_US
dc.contributor.authorPatkar, LNen_US
dc.contributor.authorLu, KCen_US
dc.contributor.authorLee, ASYen_US
dc.contributor.authorLin, CCen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:37:11Z
dc.date.available2014-12-08T15:37:11Z
dc.date.issued2004-12-06en_US
dc.description.abstractThe CBr4-photoirradiation in methanol generates a controlled source of HBr, which can chemoselectively deprotect commonly used hydroxyl-protecting groups in saccharides and nucleosides, such as tert-butyldimethylsilyl, isopropylidene, benzylidene and triphenyl ethers in the presence of other acid-labile functional groups. (C) 2004 Elsevier Ltd. All rights reserved.en_US
dc.identifier.doi10.1016/j.tet.2004.09.095en_US
dc.identifier.issn0040-4020en_US
dc.identifier.journalTETRAHEDRONen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.tet.2004.09.095en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25557
dc.identifier.wosnumberWOS:000225148000016
dc.language.isoen_USen_US
dc.subjectCBr4-photoirradiationen_US
dc.subjectdeprotectionen_US
dc.titleChemoselective deprotection of acid labile primary hydroxyl protecting groups under CBr4-photoirradiation conditionsen_US
dc.typeArticleen_US

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