低溫電漿蝕刻製程與電漿診斷技術之開發研究---子計畫三：蝕刻製程橢圓儀線上即時量測系統之研製(I)
| dc.contributor.author | 趙于飛 | en_US |
| dc.contributor.department | 國立交通大學光電工程研究所 | zh_TW |
| dc.date.accessioned | 2014-12-13T10:33:23Z | |
| dc.date.available | 2014-12-13T10:33:23Z | |
| dc.date.issued | 2003 | en_US |
| dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
| dc.identifier.govdoc | NSC92-2623-7009-001-NU | zh_TW |
| dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=801133&docId=153297 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/92038 | |
| dc.language.iso | zh_TW | en_US |
| dc.title | 低溫電漿蝕刻製程與電漿診斷技術之開發研究---子計畫三：蝕刻製程橢圓儀線上即時量測系統之研製(I) | zh_TW |
| dc.title | Ellipsometry and Its in Situ/Real Time Monitoring on Plasma Etching Process(I) | en_US |
| dc.type | Plan | en_US |