金屬線及空氣低介電常數介電質前瞻性積體技術開發(II)

dc.contributor.author	張國明	en_US
dc.contributor.author	CHANG KOW-MING	en_US
dc.contributor.department	國立交通大學電子工程學系	zh_TW
dc.date.accessioned	2014-12-13T10:40:37Z
dc.date.available	2014-12-13T10:40:37Z
dc.date.issued	2001	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC90-2215-E009-046	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=665627&docId=126354	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/97684
dc.language.iso	zh_TW	en_US
dc.subject	金屬線	zh_TW
dc.subject	低介電常數	zh_TW
dc.subject	極大型積體電路	zh_TW
dc.subject	氣隙	zh_TW
dc.subject	Metal wire	en_US
dc.subject	Low dielectric constant	en_US
dc.subject	ULSI	en_US
dc.subject	Air gap	en_US
dc.title	金屬線及空氣低介電常數介電質前瞻性積體技術開發(II)	zh_TW
dc.title	Advanced Integration Techonology of Intermetal and Air Gap Low k Dielectrics for ULSI Application (II)	en_US
dc.type	Plan	en_US

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