嵌附減光式相移光罩吸光相移層研製

dc.contributor.author	龍文安	en_US
dc.contributor.author	Loong Wen-an	en_US
dc.contributor.department	交通大學應用化學系	zh_TW
dc.date.accessioned	2014-12-13T10:38:25Z
dc.date.available	2014-12-13T10:38:25Z
dc.date.issued	1997	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC86-2215-E009-036	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=283436&docId=51274	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/95360
dc.language.iso	zh_TW	en_US
dc.subject	相移光罩	zh_TW
dc.subject	嵌入	zh_TW
dc.subject	減光	zh_TW
dc.subject	微影技術	zh_TW
dc.subject	Phase shifting mask	en_US
dc.subject	Embedding	en_US
dc.subject	Attenuated	en_US
dc.subject	Microlithography	en_US
dc.title	嵌附減光式相移光罩吸光相移層研製	zh_TW
dc.title	Fabrication of Absorptive Shifter Layer for Embedded Attenuated Phase Shift Mask	en_US
dc.type	Plan	en_US

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