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一種新式氮化矽快閃式記憶元件研究(I)

dc.contributor.author汪大暉en_US
dc.contributor.authorWANG TAHUIen_US
dc.contributor.department國立交通大學電子工程學系zh_TW
dc.date.accessioned2014-12-13T10:35:26Z
dc.date.available2014-12-13T10:35:26Z
dc.date.issued2001en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC90-2215-E009-066zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=665696&docId=126372en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/93431
dc.language.isozh_TWen_US
dc.subject氮化矽zh_TW
dc.subject快閃記憶體zh_TW
dc.subject物理特性zh_TW
dc.subject電子可抹拭唯讀記憶體zh_TW
dc.subjectSilicon nitrideen_US
dc.subjectFlash memoryen_US
dc.subjectPhysical characterizationen_US
dc.subjectEEPROMen_US
dc.title一種新式氮化矽快閃式記憶元件研究(I)zh_TW
dc.titlePhysics, Characterization and Design of Oxide-Nitride-Oxide Flash EEPROM Devices (I)en_US
dc.typePlanen_US

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