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A POLYSILICON-ON-OXIDE (POSOX) ISOLATION STRUCTURE FOR BIPOLAR INTEGRATED-CIRCUITS

dc.citation.epage845en_US
dc.citation.issue8en_US
dc.citation.spage841en_US
dc.citation.volume30en_US
dc.citation.woscount0
dc.contributor.authorLEE, CLen_US
dc.contributor.authorTAN, FLen_US
dc.contributor.authorWU, NWen_US
dc.contributor.authorTANG, RBen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.date.accessioned2014-12-08T15:06:03Z
dc.date.available2014-12-08T15:06:03Z
dc.date.issued1987-08-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/4625
dc.identifier.wosnumberWOS:A1987J494200010
dc.language.isoen_USen_US
dc.titleA POLYSILICON-ON-OXIDE (POSOX) ISOLATION STRUCTURE FOR BIPOLAR INTEGRATED-CIRCUITSen_US
dc.typeArticleen_US

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