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Behavior and surface energies of polybenzoxazines formed by polymerization with argon, oxygen, and hydrogen plasmas

dc.citation.epage4074en_US
dc.citation.issue22en_US
dc.citation.spage4063en_US
dc.citation.volume42en_US
dc.citation.woscount3
dc.contributor.authorChen, JKen_US
dc.contributor.authorLin, IKen_US
dc.contributor.authorKo, FHen_US
dc.contributor.authorHuang, CFen_US
dc.contributor.authorChen, KSen_US
dc.contributor.authorChan, CHen_US
dc.contributor.authorChang, FCen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:37:18Z
dc.date.available2014-12-08T15:37:18Z
dc.date.issued2004-11-15en_US
dc.description.abstractPolybenzoxazine (PBZZ) thin films can be fabricated by the plasma-polymerization technique with, as the energy source, plasmas of argon oxygen or hydrogen atoms and ions. When benzoxazine (BZZ) films are polymerized through the use of high-energy argon atoms, electronegative oxygen atoms, or excited hydrogen atoms, the PBZZ films that form possess different properties aid morphologies in their surfaces. High-energy argon atoms provide a thermodynamic factor to initiate the ring-opening polymerization of BZZ and result in the polymer surface having a grid-like structure. The ring-opening polymerization of the BZZ film that is initiated by cationic species such as oxygen atoms in plasma, is propagated around nodule structures to form the PBZZ. The excited hydrogen atom plasma initiates both polymerization and decomposition reactions simultaneously in the BZZ film and Results in the formation of a porous structure on the PBZZ surface. We evaluated the surface energies of the PBZZ films polymerized by the action of these three plasmas by measuring the contact angles of diiodomethane and water droplets. The surface roughness of the films range from 0.5 to 26 nm, depending on the type of carrier gas and the plasma-polymerization time. By estimating changes in thickness, we found that tie PBZZ film synthesized by the oxygen plasma-polymerization process undergoes the slowest rate of etching in CF(4) plasma. (C) 2004 Wiley Periodicals, Inc.en_US
dc.identifier.doi10.1002/polb.20255en_US
dc.identifier.issn0887-6266en_US
dc.identifier.journalJOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1002/polb.20255en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25639
dc.identifier.wosnumberWOS:000224817700004
dc.language.isoen_USen_US
dc.subjectpolybenzoxazineen_US
dc.subjectplasma treatmenten_US
dc.subjectsurface free energyen_US
dc.titleBehavior and surface energies of polybenzoxazines formed by polymerization with argon, oxygen, and hydrogen plasmasen_US
dc.typeArticleen_US

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