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Negative differential resistance in InGaAs/AlAsSb/InGaAs single-barrier heterostructure

dc.citation.epage1375en_US
dc.citation.issue10en_US
dc.citation.spage1373en_US
dc.citation.volume71en_US
dc.citation.woscount7
dc.contributor.authorChen, WKen_US
dc.contributor.authorCheng, RHen_US
dc.contributor.authorOu, Jen_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2014-12-08T15:01:28Z
dc.date.available2014-12-08T15:01:28Z
dc.date.issued1997-09-08en_US
dc.description.abstractWe have observed negative differential resistance in InP lattice-matched InGaAs/AlAsSb/InGaAs single-barrier tunneling heterostructure. With a 10-nm-thick barrier, the diode exhibits a peak-to-valley current ratio of 4.2 (1.2) and peak current density of 54 (158) A/cm(2) at 100 K(300 K). (C) 1997 American Institute of Physics.en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/310
dc.identifier.wosnumberWOS:A1997XU88900031
dc.language.isoen_USen_US
dc.titleNegative differential resistance in InGaAs/AlAsSb/InGaAs single-barrier heterostructureen_US
dc.typeArticleen_US

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