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Optical properties of surface micromachining with randomly distributed etch holes

dc.citation.epage1017en_US
dc.citation.issue2Aen_US
dc.citation.spage1015en_US
dc.citation.volume45en_US
dc.citation.woscount1
dc.contributor.authorTien, CHen_US
dc.contributor.authorLee, CHen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.date.accessioned2014-12-08T15:17:31Z
dc.date.available2014-12-08T15:17:31Z
dc.date.issued2006-02-01en_US
dc.description.abstractOptical micromachining or microelectromechanical systems (MEMS) typically require etch holes to reduce the time required to release the micromechanical structure during the sacrificial undercutting. However, high-order diffraction beams generated by the periodic etch-hole array often deteriorate the optical performance by generating noise and erroneous crosstalk signals in. most optical systems. In this study, we examined the diffraction from a perforated micromirror and proposed a random distributed etch-hole layout. Due to the superposition of cosine functions with random periods, noise caused by high-order beams can be averaged effectively.en_US
dc.identifier.doi10.1143/JJAP.45.1015en_US
dc.identifier.issn0021-4922en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.1015en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/12694
dc.identifier.wosnumberWOS:000235692100080
dc.language.isoen_USen_US
dc.subjectMEMSen_US
dc.subjectetch holesen_US
dc.subjectdiffractionen_US
dc.titleOptical properties of surface micromachining with randomly distributed etch holesen_US
dc.typeArticleen_US

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