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Growth of a-plane ZnO thin films on LaAlO3(100) substrate by metal-organic chemical vapor deposition

dc.citation.epage782en_US
dc.citation.issue4en_US
dc.citation.spage777en_US
dc.citation.volume310en_US
dc.citation.woscount20
dc.contributor.authorTian, Jr-Shengen_US
dc.contributor.authorLiang, Mel-Huien_US
dc.contributor.authorHo, Yen-Tengen_US
dc.contributor.authorLiu, Yuan-Anen_US
dc.contributor.authorChang, Lien_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.date.accessioned2014-12-08T15:12:35Z
dc.date.available2014-12-08T15:12:35Z
dc.date.issued2008-02-15en_US
dc.description.abstractZnO(1 1 (2) over bar 0) thin films were successfully grown on LaAlO3 (lanthanum aluminate) (10 0) substrate by atmospheric pressure metalorganic chemical vapor deposition. X-ray diffraction, atomic force microscopy, and scanning electron microscopy showed that ZnO films formed at 450 degrees C were composed of almost all (1 1 (2) over bar 0) oriented grains while (0 0 0 2) oriented ZnO grains started to appear at temperature above 550 degrees C. The a-plane ZnO films consisted of two types of domains with their c-axis perpendicular to each other due to LaAlO3(1 0 0) symmetry with low lattice mismatch along < 1 1 0 >. (C) 2007 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.jcrysgro.2007.11.073en_US
dc.identifier.issn0022-0248en_US
dc.identifier.journalJOURNAL OF CRYSTAL GROWTHen_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.jcrysgro.2007.11.073en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/9672
dc.identifier.wosnumberWOS:000253650000007
dc.language.isoen_USen_US
dc.subjecthigh resolution x-ray diffractionen_US
dc.subjectmetalorganic chemical vapor depositionen_US
dc.subjectoxidesen_US
dc.subjectsemiconducting II-VI materialsen_US
dc.titleGrowth of a-plane ZnO thin films on LaAlO3(100) substrate by metal-organic chemical vapor depositionen_US
dc.typeArticleen_US

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