<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css">

TRANSPORT-PROPERTIES OF THERMAL OXIDE-FILMS GROWN ON POLYCRYSTALLINE SILICON - MODELING AND EXPERIMENTS

Thumbnail Image

Files

A1987H858400023.pdf (1.59 MB)

Date

1987-07-01

Authors


Journal Title

Journal ISSN

Volume Title

Publisher

DOI

Abstract

Description

Keywords

Citation

URI

https://ir.lib.nycu.edu.tw/handle/11536/4628

Collections

期刊論文;;Articles

Endorsement

Review

Supplemented By

Referenced By