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Submicron organic thin-film transistors fabricated by film profile engineering method

dc.citation.epageen_US
dc.citation.issue4en_US
dc.citation.volume105en_US
dc.citation.woscount0
dc.contributor.authorWu, Ming-Hungen_US
dc.contributor.authorLin, Horng-Chihen_US
dc.contributor.authorLin, Hung-Chengen_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorMeng, Hsin-Feien_US
dc.contributor.authorHuang, Tiao-Yuanen_US
dc.contributor.department物理研究所zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:36:44Z
dc.date.available2014-12-08T15:36:44Z
dc.date.issued2014-07-28en_US
dc.description.abstractIn this work, we explore and demonstrate the feasibility of a film profile engineering (FPE) concept in fabricating pentacene-based organic thin-film transistors (OTFTs) with submicron channel length. The FPE scheme utilizes a suspended bridge built on the wafer and the specific deposition conditions to form thin films with desirable profiles. In order to form a continuous pentacene channel under the bridge, the background pressure of thermal evaporator is adjusted by pumping down the filling N-2 to a specific level. The results show that, by setting the deposition pressure at 3 mtorr, functional operations of OTFTs with channel length ranging from 0.4 to 0.6 mu m are obtained. (C) 2014 AIP Publishing LLC.en_US
dc.identifier.doi10.1063/1.4892404en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4892404en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25090
dc.identifier.wosnumberWOS:000341152600080
dc.language.isoen_USen_US
dc.titleSubmicron organic thin-film transistors fabricated by film profile engineering methoden_US
dc.typeArticleen_US

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