REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS
| dc.citation.epage | C93 | en_US |
| dc.citation.issue | 3 | en_US |
| dc.citation.spage | C93 | en_US |
| dc.citation.volume | 127 | en_US |
| dc.citation.woscount | 0 | |
| dc.contributor.author | GUO, SF | en_US |
| dc.contributor.author | CHU, TY | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2014-12-08T15:06:30Z | |
| dc.date.available | 2014-12-08T15:06:30Z | |
| dc.date.issued | 1980 | en_US |
| dc.identifier.issn | 0013-4651 | en_US |
| dc.identifier.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/5076 | |
| dc.identifier.wosnumber | WOS:A1980JJ15600194 | |
| dc.language.iso | en_US | en_US |
| dc.title | REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS | en_US |
| dc.type | Meeting Abstract | en_US |
Files
License bundle
1 - 1 of 1
Loading...
- Name:
- license.txt
- Size:
- 1.71 KB
- Format:
- Item-specific license agreed to upon submission
- Description: