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Impact of Electroforming Current on Self-Compliance Resistive Switching in an ITO/Gd:SiOx/TiN Structure

dc.citation.epage860en_US
dc.citation.issue7en_US
dc.citation.spage858en_US
dc.citation.volume34en_US
dc.citation.woscount6
dc.contributor.authorTseng, Hsueh-Chihen_US
dc.contributor.authorChang, Ting-Changen_US
dc.contributor.authorWu, Yi-Chunen_US
dc.contributor.authorWu, Sei-Weien_US
dc.contributor.authorHuang, Jheng-Jieen_US
dc.contributor.authorChen, Yu-Tingen_US
dc.contributor.authorYang, Jyun-Baoen_US
dc.contributor.authorLin, Tzu-Pingen_US
dc.contributor.authorSze, Simon. M.en_US
dc.contributor.authorTsai, Ming-Jinnen_US
dc.contributor.authorWang, Ying-Langen_US
dc.contributor.authorChu, Ann-Kuoen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:32:05Z
dc.date.available2014-12-08T15:32:05Z
dc.date.issued2013-07-01en_US
dc.description.abstractThis letter investigates self-compliance behavior for nonvolatile resistance random access memory using the indium tin oxide (ITO)/Gd:SiOx/TiN structure. Different current compliances in the electroforming process results in different trends in the set process, including a different self-compliance scale and one-or two-step set behaviors. The oxygen ions generated during the electroforming and set process drift to ITO, inducing a semiconductor-like ITO interface formation, which can be regarded as a self-built series resistor.en_US
dc.identifier.doi10.1109/LED.2013.2259135en_US
dc.identifier.issn0741-3106en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2013.2259135en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/22601
dc.identifier.wosnumberWOS:000323685700012
dc.language.isoen_USen_US
dc.subjectIndium tin oxide (ITO)en_US
dc.subjectresistance switchingen_US
dc.subjectresistive random access memory (ReRAM)en_US
dc.subjectself-built current complianceen_US
dc.titleImpact of Electroforming Current on Self-Compliance Resistive Switching in an ITO/Gd:SiOx/TiN Structureen_US
dc.typeArticleen_US

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