Silicon-Germanium Structure in Surrounding-Gate Strained Silicon Nanowire Field Effect Transistors

Abstract

In this paper we numerically examine the electrical characteristics of surrounding-gate strained silicon nanowire field effect transistors (FETs) by changing the radius (RSiGe) of silicon-germanium (SiGe) wire. Due to the higher electron mobility, the n-type FETs with strained silicon channel films do enhance driving capability (similar to 8% increment on the drain current) in comparison with the pure Si one. The leakage current and transfer characteristics, the threshold-voltage (V-t), the drain induced barrier height lowering (DIBL), and the gate capacitance (C-G) are estimated with respect to different gate length (L-G), gate bias (V-G), and R-SiGe. For short channel effects, such as V-t roll-off and DIBL, the surrounding-gate strained silicon nanowire FET sustains similar characteristics with the pure Si one.