Design of a dual-probe profilometer

Abstract

This paper proposes a design of a dual-probe profilometer, which successfully utilizes a compensation method with two probe modules to scan a 200 nm step height standard sample with 5% scanning error. Compared with traditional profilometers, this design possesses high scanning precise performance without using large and heavy optical flats to increase the flatness when sample stage is moving. The experimental results show the compensation method is valid and can be applied in nano-scale scanning.