A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR
| dc.citation.epage | 283 | en_US |
| dc.citation.issue | 4 | en_US |
| dc.citation.spage | 273 | en_US |
| dc.citation.volume | 17 | en_US |
| dc.citation.woscount | 28 | |
| dc.contributor.author | BHATTACHARYA, PK | en_US |
| dc.contributor.author | REISMAN, A | en_US |
| dc.contributor.author | CHEN, MC | en_US |
| dc.contributor.department | 交大名義發表 | zh_TW |
| dc.contributor.department | National Chiao Tung University | en_US |
| dc.date.accessioned | 2014-12-08T15:05:58Z | |
| dc.date.available | 2014-12-08T15:05:58Z | |
| dc.date.issued | 1988-07-01 | en_US |
| dc.identifier.doi | 10.1007/BF02652106 | en_US |
| dc.identifier.issn | 0361-5235 | en_US |
| dc.identifier.journal | JOURNAL OF ELECTRONIC MATERIALS | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1007/BF02652106 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/4510 | |
| dc.identifier.wosnumber | WOS:A1988P335800002 | |
| dc.language.iso | en_US | en_US |
| dc.title | A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR | en_US |
| dc.type | Article | en_US |
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