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Defect-enhanced photoconductive response of silicon-implanted borosilicate glass (vol 85, pg 935, 2004)

dc.citation.epage3325en_US
dc.citation.issue15en_US
dc.citation.spage3325en_US
dc.citation.volume85en_US
dc.citation.woscount1
dc.contributor.authorLin, GRen_US
dc.contributor.authorLin, CJen_US
dc.contributor.authorLin, CKen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:37:27Z
dc.date.available2014-12-08T15:37:27Z
dc.date.issued2004-10-11en_US
dc.identifier.doi10.1063/1.1804499en_US
dc.identifier.issn0003-6951en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.1804499en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/25767
dc.identifier.wosnumberWOS:000224679300110
dc.language.isoen_USen_US
dc.titleDefect-enhanced photoconductive response of silicon-implanted borosilicate glass (vol 85, pg 935, 2004)en_US
dc.typeCorrectionen_US

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