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Enhancement of operation temperature of InAs/GaAs quantum-dot infrared photodetectors with hydrogen-plasma treatment

dc.citation.epage2105en_US
dc.citation.issue5en_US
dc.citation.spage2102en_US
dc.citation.volume27en_US
dc.citation.woscount1
dc.contributor.authorLin, Wei-Hsunen_US
dc.contributor.authorTseng, Chi-Cheen_US
dc.contributor.authorChao, Kuang-Pingen_US
dc.contributor.authorLin, Shih-Yenen_US
dc.contributor.authorWu, Meng-Chyien_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:08:49Z
dc.date.available2014-12-08T15:08:49Z
dc.date.issued2009-09-01en_US
dc.description.abstractPostprocess hydrogen treatment is performed over fabricated ten-period InAs/GaAs quantum-dot infrared photodetectors. While keeping similar spectral responses at the same applied voltage, a reduced dark current is observed for the H-plasma-treated device, which is attributed to the suppression of surface leakage-current induced by surface damage during device processing. The significant reduction in dark current also enhanced the operation temperature of the device up to 100 K. Also observed are the smoothed-out mesa edges after the H-plasma treatment, which results in trapezoidal mesa edges. In this case, a longer propagation length in the device of the reflected incident light at the mesa edge would enhance the normal-incident absorption ratio of the H-plasma-treated device. (C) 2009 American Vacuum Society. [DOI:10.1116/1.3196781]en_US
dc.identifier.doi10.1116/1.3196781en_US
dc.identifier.issn1071-1023en_US
dc.identifier.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY Ben_US
dc.identifier.urihttp://dx.doi.org/10.1116/1.3196781en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/6732
dc.identifier.wosnumberWOS:000270447400008
dc.language.isoen_USen_US
dc.titleEnhancement of operation temperature of InAs/GaAs quantum-dot infrared photodetectors with hydrogen-plasma treatmenten_US
dc.typeArticleen_US

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