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下一世代高性能及高可靠性的N通道MOS元件設計及量測技術探討

dc.contributor.author莊紹勳en_US
dc.contributor.authorChung Steve Sen_US
dc.contributor.department國立交通大學電子工程學系及電子研究所zh_TW
dc.date.accessioned2014-12-13T10:42:09Z
dc.date.available2014-12-13T10:42:09Z
dc.date.issued2011en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC98-2221-E009-161-MY3zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=2205386&docId=351807en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/98976
dc.language.isozh_TWen_US
dc.title下一世代高性能及高可靠性的N通道MOS元件設計及量測技術探討zh_TW
dc.titleKey Design and Measurement Issues for Achieving High Performance and High Reliability Next Generation N-Channel Mosfetsen_US
dc.typePlanen_US

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