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Efficient reduction of graphene oxide catalyzed by copper

dc.citation.epage3088en_US
dc.citation.issue9en_US
dc.citation.spage3083en_US
dc.citation.volume14en_US
dc.citation.woscount4
dc.contributor.authorLin, Yu-Chuanen_US
dc.contributor.authorLiu, Keng-Kuen_US
dc.contributor.authorWu, Chih-Yuen_US
dc.contributor.authorChu, Chih-Weien_US
dc.contributor.authorWang, Jacob Tse-Weien_US
dc.contributor.authorLiang, Chi-Teen_US
dc.contributor.authorLi, Lain-Jongen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.date.accessioned2014-12-08T15:21:30Z
dc.date.available2014-12-08T15:21:30Z
dc.date.issued2012en_US
dc.description.abstractWe report that copper thin films deposited on top of graphene oxide (GO) serve as an effective catalyst to reduce GO sheets in a diluted hydrogen environment at high temperature. The reduced GO (rGO) sheets exhibit higher effective field-effect hole mobility, up to 80 cm(2) V-1 s(-1), and lower sheet resistance (13 k Omega square(-1)) compared with those reduced by reported methods such as hydrazine and thermal annealing. Raman and XPS characterizations are addressed to study the reduction mechanism on graphene oxide underneath copper thin films. The level of reduction in rGO sheets is examined by Raman spectroscopy and it is well correlated with hole mobility values. The conductivity enhancement is attributed to the growth of the graphitic domain size. This method is not only suitable for reduction of single GO sheets but also applicable to lower the sheet resistance of Langmuir-Blodgett assembled GO films.en_US
dc.identifier.doi10.1039/c2cp23187een_US
dc.identifier.issn1463-9076en_US
dc.identifier.journalPHYSICAL CHEMISTRY CHEMICAL PHYSICSen_US
dc.identifier.urihttp://dx.doi.org/10.1039/c2cp23187een_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/15276
dc.identifier.wosnumberWOS:000300046800015
dc.language.isoen_USen_US
dc.titleEfficient reduction of graphene oxide catalyzed by copperen_US
dc.typeArticleen_US

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