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Direct Observation of Electron Dephasing due to Inelastic Scattering from Defects in Weakly Disordered AuPd Wires

dc.citation.epage0en_US
dc.citation.issue20en_US
dc.citation.spage0en_US
dc.citation.volume104en_US
dc.citation.woscount22en_US
dc.contributor.authorZhong, Yuan-Liangen_US
dc.contributor.authorSergeev, Andreien_US
dc.contributor.authorChen, Chii-Dongen_US
dc.contributor.authorLin, Juhn-Jongen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentInstitute of Physicsen_US
dc.date.accessioned2019-04-03T06:38:18Z
dc.date.available2019-04-03T06:38:18Z
dc.date.issued2010-05-21en_US
dc.description.abstractTo identify and investigate the mechanisms of electron-phonon (e-ph) relaxation in weakly disordered metallic conductors, we measure the electron dephasing rate in a series of suspended and supported 15-nm thick AuPd wires. In a wide temperature range, from similar to 8 K to above 20 K, the e-ph interaction dominates in the dephasing processes. The corresponding relaxation rate reveals a quadratic temperature dependence, tau(-1)(e-ph) = A(ep)T(2), where A(ep) approximate to 5 x 10(9) K(-2) s(-1) is essentially the same for all samples studied. Our observations are shown to be in good agreement with the theory which predicts that, even in weakly disordered metallic structures at moderately low temperatures, the major mechanism of the e-ph relaxation is the electron scattering from vibrating defects and impurities.en_US
dc.identifier.doi10.1103/PhysRevLett.104.206803en_US
dc.identifier.issn0031-9007en_US
dc.identifier.journalPHYSICAL REVIEW LETTERSen_US
dc.identifier.urihttp://dx.doi.org/10.1103/PhysRevLett.104.206803en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/5392
dc.identifier.wosnumberWOS:000277945900040en_US
dc.language.isoen_USen_US
dc.titleDirect Observation of Electron Dephasing due to Inelastic Scattering from Defects in Weakly Disordered AuPd Wiresen_US
dc.typeArticleen_US

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