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Microwave plasma-assisted photoluminescence enhancement in nitrogen-doped ultrananocrystalline diamond film

dc.citation.epageen_US
dc.citation.issue2en_US
dc.citation.volume2en_US
dc.citation.woscount1
dc.contributor.authorLiu, Yu Linen_US
dc.contributor.authorSun, Kien Wenen_US
dc.contributor.authorLin, Yi Jieen_US
dc.contributor.authorFong, Shih-Chiehen_US
dc.contributor.authorLin, I. Nanen_US
dc.contributor.authorTai, Nyan Hwaen_US
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.date.accessioned2014-12-08T15:23:35Z
dc.date.available2014-12-08T15:23:35Z
dc.date.issued2012-06-01en_US
dc.description.abstractOptical properties and conductivity of nitrogen-doped ultrananocrystal diamond (UNCD) films were investigated following treatment with low energy microwave plasma at room temperature. The plasma also generated vacancies in UNCD films and provided heat for mobilizing the vacancies to combine with the impurities, which formed the nitrogen-vacancy defect centers. The generated color centers were distributed uniformly in the samples. The conductivity of nitrogen-doped UNCD films treated by microwave plasma was found to decrease slightly due to the reduced grain boundaries. The photoluminescence emitted by the plasma treated nitrogen-doped UNCD films was enhanced significantly compared to the untreated films. Copyright 2012 Author(s). This article is distributed under a Creative Commons Attribution 3.0 Unported License. [http://dx.doi.org/10.1063/1.4727743]en_US
dc.identifier.doi022145en_US
dc.identifier.issn2158-3226en_US
dc.identifier.journalAIP ADVANCESen_US
dc.identifier.urihttp://dx.doi.org/022145en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/16494
dc.identifier.wosnumberWOS:000305831300046
dc.language.isoen_USen_US
dc.titleMicrowave plasma-assisted photoluminescence enhancement in nitrogen-doped ultrananocrystalline diamond filmen_US
dc.typeArticleen_US

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