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The growth of heteroepitaxial CuInSe2 on free-standing N-polar GaN

dc.citation.issue12en_US
dc.citation.woscount0en_US
dc.contributor.authorShih, Cheng-Hungen_US
dc.contributor.authorLo, Ikaien_US
dc.contributor.authorYou, Shuo-Tingen_US
dc.contributor.authorTsai, Cheng-Daen_US
dc.contributor.authorTseng, Bae-Hengen_US
dc.contributor.authorChen, Yun-Fengen_US
dc.contributor.authorChen, Chiao-Hsinen_US
dc.contributor.authorLee, Chuo-Hanen_US
dc.contributor.authorLee, Wei-Ien_US
dc.contributor.authorHsu, Gary Z. L.en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.date.accessioned2015-07-21T11:21:07Z
dc.date.available2015-07-21T11:21:07Z
dc.date.issued2014-12-01en_US
dc.description.abstractWe report that chalcopyrite CuInSe2 thin films were grown on free-standing N-polar GaN (000 (1) over bar) by molecular beam epitaxy. X-ray diffraction showed that the CuInSe2 thin film was grown in (112) orientation, and its peak of rocking curve with full width at half maximum of about 897.8 arc-sec indicated the epitaxial growth of CuInSe2 (112) film on N-polar GaN. Microstructure analysis of the CuInSe2 showed that the large lattice mismatch (28.5%) between CuInSe2 and GaN is accommodated by domain matching, and no interface reaction occurs between CuInSe2 and GaN. Our experimental results show that GaN is stable for the epitaxial growth of CuInSe2 thin film, which exhibits a promising potential for optoelectronic applications. (C) 2014 Author(s).en_US
dc.identifier.doi10.1063/1.4904030en_US
dc.identifier.issn2158-3226en_US
dc.identifier.journalAIP ADVANCESen_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.4904030en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/124083
dc.identifier.wosnumberWOS:000347170100051en_US
dc.language.isoen_USen_US
dc.titleThe growth of heteroepitaxial CuInSe2 on free-standing N-polar GaNen_US
dc.typeArticleen_US

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