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12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫一:12吋矽晶圓CVD製程設備的加熱及成長BST薄膜之進氣系統設計與反應爐系統整合(II)

dc.contributor.author林清發en_US
dc.contributor.authorLIN TSING-FAen_US
dc.contributor.department國立交通大學機械工程研究所zh_TW
dc.date.accessioned2014-12-13T10:51:46Z
dc.date.available2014-12-13T10:51:46Z
dc.date.issued2000en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.identifier.govdocNSC89-2212-E009-079zh_TW
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=549681&docId=101493en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/102880
dc.language.isozh_TWen_US
dc.title12吋矽晶圓半導體CVD製程設備及BST介電薄膜成長研究---子計畫一:12吋矽晶圓CVD製程設備的加熱及成長BST薄膜之進氣系統設計與反應爐系統整合(II)zh_TW
dc.titleDesign of Heating Assembly and Gas Feeding Unit for BST Thin Film Growth and Integration of CVD Reactor System for a 12-inch Single Silicon Wafer (II)en_US
dc.typePlanen_US

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