低溫薄膜電晶體之相關薄絕緣層之製備研究

dc.contributor.author	李崇仁	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
dc.date.accessioned	2014-12-13T10:41:03Z
dc.date.available	2014-12-13T10:41:03Z
dc.date.issued	2000	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.identifier.govdoc	NSC89-2215-E009-030	zh_TW
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=542081&docId=99576	en_US
dc.identifier.uri	https://ir.lib.nycu.edu.tw/handle/11536/98162
dc.language.iso	zh_TW	en_US
dc.subject	複晶矽	zh_TW
dc.subject	薄絕緣層	zh_TW
dc.subject	薄膜電晶體	zh_TW
dc.subject	化學氣相沈積法	zh_TW
dc.subject	低溫快速退火	zh_TW
dc.subject	準分子雷射	zh_TW
dc.subject	Polysilicon	en_US
dc.subject	Thin dielectric film	en_US
dc.subject	Thin film transistor	en_US
dc.subject	Chemical vapor deposition (CVD)	en_US
dc.subject	Rapid thermal process	en_US
dc.subject	Excimer laser	en_US
dc.title	低溫薄膜電晶體之相關薄絕緣層之製備研究	zh_TW
dc.title	The Study on Thin Dielectrics Preparation Technology for Low Temperature TFTs	en_US
dc.type	Plan	en_US

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