Off-axis unbalanced magnetron sputtering of YBa2Cu3O7 thin films
| dc.citation.epage | 233 | en_US |
| dc.citation.issue | 3 | en_US |
| dc.citation.spage | 229 | en_US |
| dc.citation.volume | 49 | en_US |
| dc.citation.woscount | 0 | |
| dc.contributor.author | Tsai, WC | en_US |
| dc.contributor.author | Tseng, TY | en_US |
| dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
| dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
| dc.date.accessioned | 2014-12-08T15:01:37Z | |
| dc.date.available | 2014-12-08T15:01:37Z | |
| dc.date.issued | 1997-07-01 | en_US |
| dc.description.abstract | An unbalanced magnet assembly is used in DC off-axis sputtering to grow YBa2Cu3O7 superconducting thin films. The assembly with a stronger central magnet than the annular magnet directs plasma to bombard the off-axis substrate, resulting in deteriorated thin films. In contrast, the assembly with a weaker central magnet directs plasma away from the off-axis substrate and results in a film with a higher transition temperature and a smoother surface. Furthermore, the latter type of unbalanced DC magnetron sputtering gives a higher deposition rate and enables the grown film to be uniform in composition on static substrates over a range of 8 cm in length. These results reveal the feasibility of using the unbalanced magnetron for thin film growth. | en_US |
| dc.identifier.issn | 0254-0584 | en_US |
| dc.identifier.journal | MATERIALS CHEMISTRY AND PHYSICS | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/448 | |
| dc.identifier.wosnumber | WOS:A1997XP59600007 | |
| dc.language.iso | en_US | en_US |
| dc.subject | unbalanced magnetron | en_US |
| dc.subject | YBCO | en_US |
| dc.subject | thin films | en_US |
| dc.subject | sputtering | en_US |
| dc.title | Off-axis unbalanced magnetron sputtering of YBa2Cu3O7 thin films | en_US |
| dc.type | Article | en_US |