SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM
| dc.citation.epage | 389 | en_US |
| dc.citation.spage | 380 | en_US |
| dc.citation.volume | 2087 | en_US |
| dc.contributor.author | LOONG, WA | en_US |
| dc.contributor.author | SHY, SL | en_US |
| dc.contributor.author | GUO, GC | en_US |
| dc.contributor.author | CHOU, YL | en_US |
| dc.contributor.department | 應用化學系 | zh_TW |
| dc.contributor.department | Department of Applied Chemistry | en_US |
| dc.date.accessioned | 2014-12-08T15:27:54Z | |
| dc.date.available | 2014-12-08T15:27:54Z | |
| dc.date.issued | 1994 | en_US |
| dc.identifier.doi | 10.1117/12.167280 | en_US |
| dc.identifier.isbn | 0-8194-1356-9 | en_US |
| dc.identifier.journal | 13TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT | en_US |
| dc.identifier.uri | http://dx.doi.org/10.1117/12.167280 | en_US |
| dc.identifier.uri | https://ir.lib.nycu.edu.tw/handle/11536/20163 | |
| dc.identifier.wosnumber | WOS:A1994BZ89N00038 | |
| dc.language.iso | en_US | en_US |
| dc.title | SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIM | en_US |
| dc.type | Proceedings Paper | en_US |