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Investigation of anomalous inversion C-V characteristics for long-channel MOSFETs with leaky dielectrics: Mechanisms and reconstruction

dc.citation.epage109en_US
dc.citation.issue1en_US
dc.citation.spage104en_US
dc.citation.volume21en_US
dc.citation.woscount2
dc.contributor.authorLee, Weien_US
dc.contributor.authorSu, Pinen_US
dc.contributor.authorSu, Ke-Weien_US
dc.contributor.authorChiang, Chung-Shien_US
dc.contributor.authorLiu, Sallyen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.date.accessioned2014-12-08T15:12:40Z
dc.date.available2014-12-08T15:12:40Z
dc.date.issued2008-02-01en_US
dc.description.abstractThis paper investigates anomalous inversion capacitance-voltage (C-V) attenuation for MOSFETs with leaky dielectrics. We propose to reconstruct the inversion C-V characteristic based on long-channel MOSFETs using the concept of intrinsic input resistance (R-ii). The concept of R-ii has been validated by segmented BSIM4/SPICE simulation. Our reconstructed C-V characteristics show poly-depletion effects, which are not visible in the two-frequency three-element method and agree well with the North Carolina State University-CVC simulation results. The intrinsic input resistance dominates the overall gate-current-induced debiasing effect (similar to 95% for L = 20 mu m) and can be extracted directly from the I-V characteristics. Due to its simplicity, our proposed R-ii approach may provide an option for regular process monitoring purposes.en_US
dc.identifier.doi10.1109/TSM.2007.914374en_US
dc.identifier.issn0894-6507en_US
dc.identifier.journalIEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURINGen_US
dc.identifier.urihttp://dx.doi.org/10.1109/TSM.2007.914374en_US
dc.identifier.urihttps://ir.lib.nycu.edu.tw/handle/11536/9747
dc.identifier.wosnumberWOS:000253101700013
dc.language.isoen_USen_US
dc.subjectcapacitance-voltage (C-V)en_US
dc.subjectintrinsic input resistanceen_US
dc.subjectmetal-oxide-emiconductor (MOS) capacitanceen_US
dc.subjectMOSFETen_US
dc.subjectultrathin gate oxideen_US
dc.titleInvestigation of anomalous inversion C-V characteristics for long-channel MOSFETs with leaky dielectrics: Mechanisms and reconstructionen_US
dc.typeArticleen_US

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